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Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID

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Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID

Brand Name : Zhongda

Certification : CE

Place of Origin : Zhaoqing, Guangdong

MOQ : 1

Delivery Time : 45~60 days

Application : Optical, Decorative, Functional

Coating Product : Glass,Metal,Plastic,Ceramic,etc

Coating Color : Gold, Silver, Black, Blue, Green, etc.

Target Size : Customizable

Target Material : Ti，Al, Cr, Au，Ag，Cu

Coating Technology : Magnetron Sputtering

Coatings : TiN, TiC, TiCN, TiAlN, CrN, CU, AU, DLC

Coating Colors : Black/Blue/Red/gold//rose gold/blue/silver etc.

Machine Size : Customize

Coating Thickness : 0.01-10 micron

Vacuum System : High Vacuum

Coating Uniformity : ≤±5%

Coating Process : Magnetron Sputtering

Power Supply : DC/RF/AC

Substrate Material : Glass, Metal, Ceramic, Plastic

Substrate Size : Customizable

Coating Structure : Single Layer, Multi-layer, Gradient, etc.

Control System : PLC, Touch Screen, Automatic

Coating Equipment Size : Customizable

Coating Material : Metal, Alloy, Ceramic, Composite Material

Coating Method : Magnetron Sputtering

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Magnetron Sputtering Optical Coating Equipment
It is widely used to coat high-precision optical films on 2D / 2.5D / 3D substrates such as glass, plastic, and metal. It can deposit UV / IR cut-off filters, band-pass filters, RGB filters, LiDAR, AR films, hard AR films, hard films (SiN or DLC), HR films, AS / AF films, dielectric films, transparent conductive films (ITO), metal films (tantalum, titanium, aluminum, chromium, copper), decorative films (CrN, CrON), semiconductors (amorphous silicon, polysilicon), etc.
This series of equipment adopts a combination of metal-mode sputtering technology and high-reactive plasma sources. The load-lock chamber is equipped with a manipulator for automatic substrate transfer. The uniformity in mass production is less than ±1%, ensuring high-quality production. The patented RF-ICP / CCP ion source features a wide working range, balanced energy, high ionization rate, stable operating efficiency, and low energy consumption. It can clean substrates and assist coating to improve film quality.
We offer full optical coating solution. Support you in efficiently creating various high-performance optical films like AR, hard DLC, hydrophobic, AF, AS, ITO, HR, and even multifunctional multi-layer films like DLC+AR+AF
Effective Area(mm)
1650x750
2550x1200~1800
2000x1600
2500x1550
Rotational speed
10~100RPM
10~50RPM
Plasma Source
ICP/CCP
DC/ICP/CCP
Evaporation
In-line AF/AS Evaporation Source
Thermal Inline AS/AF
Wavelength
300~1560
300~780
380~780

Product Tags:

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